CVD Diamond Substrate

We provide a variety of high-performance, multipurpose CVD diamond substrates.

  • CVD Diamond for Dressing Tools
  • CVD Diamond Coating for Thermal Management
  • CVD Diamond for Wire Drawing Dies
  • CVD Diamond for Cutting Tools
  • CVD Diamond for Optical Windows

CVD Diamond Substrates (Chemical Vapor Deposition Diamond Substrates) are materials that use thin films of diamond manufactured using the Chemical Vapor Deposition (CVD) method as substrates. In the CVD method, diamond is grown on a substrate by a chemical reaction using a gaseous carbon source (usually methane). This process allows for the creation of high-quality diamond thin films.

Features of CVD Diamond Substrate:

High thermal conductivity
Diamond has higher thermal conductivity than metal, making it suitable for applications where thermal management is important.
Excellent hardness and wear resistance
As the hardest substance in nature, diamond is resistant to friction and wear, making it useful for cutting and grinding tools.
High electrical insulation
Diamond is an excellent insulator, making it useful for equipment and devices that require electrical properties.
High chemical stability
Diamond is chemically very stable, able to maintain its performance even under harsh conditions.
Transparency and optical properties
With its high transparency and ability to transmit a wide range of light from ultraviolet to infrared, it is also applicable to optical devices.

Main Applications:

It is possible to customize high-quality CVD single-crystal diamond products according to various sizes and specifications.

CVD Diamond Substrate for Cutting Tools

Manufacturing Method CVD Method
Maximum Dimensions (mm) 30.0 × 30.0 × 10.0
Nitrogen Contentq <50 ppm
Hardness (Microhardness) 80 - 150 GPa
Young's Modulus 1150 - 1300 GPa
Friction Coefficient 0.05 - 0.15
Thermal Expansion Coefficient 10-6·K-1
Thermal Conductivity 1500 - 2300 W/(m·K)
Crystal Orientation 100/110/111
Mis-cut in Main Surface Direction 3°±
Lateral Tolerance ±0.05 mm
Thickness Tolerance ±0.1 mm
Surface Roughness <10 nm
Edge Cutting Laser Cutting

CVD Diamond Substrate for Optical Windows

Refractive Index (1064 nm) 2.392
Refractive Index (600 nm) 2.415
Transmittance (1064 nm) >68%
Transmittance (8 μm - 25 μm) >70%
Thermal Conductivity >2000 W/mK
Crystal Orientation 100/110/111
Mis-cut of Main Face Direction 3°±
Lateral Tolerance ±0.05 mm
Thickness Tolerance ±0.1 mm
Parallelism <2′
Surface Roughness <10 nm
Edge Cutting Laser Cutting