CVD Diamond Substrate
We provide a variety of high-performance, multipurpose CVD diamond substrates.
- CVD Diamond for Dressing Tools
- CVD Diamond Coating for Thermal Management
- CVD Diamond for Wire Drawing Dies
- CVD Diamond for Cutting Tools
- CVD Diamond for Optical Windows
CVD Diamond Substrates (Chemical Vapor Deposition Diamond Substrates) are materials that use thin films of diamond manufactured using the Chemical Vapor Deposition (CVD) method as substrates. In the CVD method, diamond is grown on a substrate by a chemical reaction using a gaseous carbon source (usually methane). This process allows for the creation of high-quality diamond thin films.
Features of CVD Diamond Substrate:
- High thermal conductivity
- Diamond has higher thermal conductivity than metal, making it suitable for applications where thermal management is important.
- Excellent hardness and wear resistance
- As the hardest substance in nature, diamond is resistant to friction and wear, making it useful for cutting and grinding tools.
- High electrical insulation
- Diamond is an excellent insulator, making it useful for equipment and devices that require electrical properties.
- High chemical stability
- Diamond is chemically very stable, able to maintain its performance even under harsh conditions.
- Transparency and optical properties
- With its high transparency and ability to transmit a wide range of light from ultraviolet to infrared, it is also applicable to optical devices.
Main Applications:
- Diamond Cutting Tools
- For Wire Drawing Dies
- Optical Windows
- Thermal Management Applications (Heat Spreaders for Lasers, etc.)
- Dressing Tools
- Electronic Devices (High Frequency, High Voltage Devices)
It is possible to customize high-quality CVD single-crystal diamond products according to various sizes and specifications.
CVD Diamond Substrate for Cutting Tools
Manufacturing Method | CVD Method |
---|---|
Maximum Dimensions (mm) | 30.0 × 30.0 × 10.0 |
Nitrogen Contentq | <50 ppm |
Hardness (Microhardness) | 80 - 150 GPa |
Young's Modulus | 1150 - 1300 GPa |
Friction Coefficient | 0.05 - 0.15 |
Thermal Expansion Coefficient | 10-6·K-1 |
Thermal Conductivity | 1500 - 2300 W/(m·K) |
Crystal Orientation | 100/110/111 |
Mis-cut in Main Surface Direction | 3°± |
Lateral Tolerance | ±0.05 mm |
Thickness Tolerance | ±0.1 mm |
Surface Roughness | <10 nm |
Edge Cutting | Laser Cutting |
CVD Diamond Substrate for Optical Windows
Refractive Index (1064 nm) | 2.392 |
---|---|
Refractive Index (600 nm) | 2.415 |
Transmittance (1064 nm) | >68% |
Transmittance (8 μm - 25 μm) | >70% |
Thermal Conductivity | >2000 W/mK |
Crystal Orientation | 100/110/111 |
Mis-cut of Main Face Direction | 3°± |
Lateral Tolerance | ±0.05 mm |
Thickness Tolerance | ±0.1 mm |
Parallelism | <2′ |
Surface Roughness | <10 nm |
Edge Cutting | Laser Cutting |