Silicon Parts for Etching Equipment
We provide high-purity silicon components for semiconductor manufacturing equipment.
With excellent plasma resistance, low particle generation characteristics, and high-precision processing, our products are suitable for semiconductor manufacturing processes such as dry etching equipment.
Main Products
- Focus Rings
- Edge Rings
- Silicon Electrodes
- C-Shroud
- Outer Rings
- Other Silicon Components for Plasma Etching
| Product Name | Size (Reference) |
|---|---|
| Silicon Electrode | φ320–450 mm × t10–25 mm |
| C-Shroud | φ530 mm × t30–65 mm |
| Outer Ring | φ350–450 mm × t10–25 mm |
| Focus Ring | φ320 mm × t3–7 mm |